Morning, Antique Art Print Morgen Hans Barthelmess 1908
Artst: Hans Barthelmess. (initialed and dated right down).
Chrome Photolithography (Photomasks)
Photomasks used for optical lithography contain the pattern of the integrated circuits. The basis is a so called blank: a glass substrate which is coated with a chrome and a resist layer. The resist is sensitive to electron beams and can be transferred into the chrome layer via etch processes. The chrome represents opaque areas on the photomask which are responsible for the casting of shadow during exposure of the silicon wafers.
Published by the Kunst, in Vienna in 1908.
Museum Quality Antique Print. Drawn and engraved by the best artist of the time. Verso Black.
Sheet app.: 40 x 30 cm. 15.75 x 11.75 inches. Image app: 16 x 17 cm. 6.25 x 6.5 inches. Type of paper: Thick. Condition: Excellent.
